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DescriptionPulsed Laser Deposition in Action.jpg
English: Thin films of oxides are deposited with atomic layer precision using pulsed laser deposition. A high-intensity pulsed laser is shooting onto the——rotating white target consisting of Al2O3 (alumina). The laser pulse creates a plasma explosion visible as the "purple cloud." The plasma cloud expands towards the square substrate, consisting of SrTiO3 (strontium titanate), where it deposits thin layers of alumina, "one atomic layer at a time." This results in a conducting interface between the two materials which are otherwise insulating. The substrate is mounted on a heating plate, glowing red from a temperature of 650 ºC,——to improve the crystallinity of the alumina thin film.
Date
Source Own work
Author Adam Andersen Læssøe

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27 November 2015

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Date/TimeThumbnailDimensionsUserComment
current07:32, 30 November 2015Thumbnail for version as of 07:32, 30 November 20152,782 × 3,952 (4.22 MB)AalassoUser created page with UploadWizard

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Online copyright statementhttps://creativecommons.org/licenses/by-sa/4.0/
Copyright holder
  • Adam A. Læssøe 2015
AuthorAdam Andersen Læssøe
Short title
  • PLD in action
Usage terms
  • Creative Commons – Share Alike 4.0
Horizontal resolution240 dpi
Vertical resolution240 dpi
Copyright statusCopyrighted
Unique ID of original documentE8A07E13364B95BBDC59F6554A1A080E
Date metadata was last modified13:20, 29 November 2015
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